A novel polyamide containing a naphthylurea moiety as the photoreaction site (Np Urea-PA) was synthesized by polycondensation of N-3, 5-dicarboxyphenyl-N′-1-naphthylurea and 4, 4′-oxydianiline (ODA). The model reactions, which consisted of irradiation by UV light of the low molecular weight aromatic ureas and isocyanate, suggested that the photochemistry involves an aromatic isocyanate intermediate. Np Urea-PA acts as the negativeworking resist, by UV irradiation through a quartz mask followed by development using aprotic solvents such as N, N-dimethylacetamide (DMAc). The contrast of the negative tone image was improved by using 20 wt% of p-xylylenediamine (pXDA) as a crosslinking agent.
Get full access to this article
View all access options for this article.
References
1.
[1] Cassidy P E1980Thermally Stable Polymers (New York: Dekker)
2.
[2] Rubner R, Ahne H, Kuhn E and Koloddieg G1979Photogr. Sci. Eng.23303-303
3.
[3] Yoda N and Hiramoto H1984J. Macromol Sci.-Chem. A211641-1641
4.
[4] Kubota S, Morikawa T, Ando T and Fukami A1987J. Macromol. Sci.-Chem. A241407-1407
5.
[5] Omote T and Yamaoka T1992Polym. Engr. Sci.321634-1634
6.
[6] Nakayama T, Mochizuki A and Ueda M1996Reactive Functional Polym.30109–115
7.
[7] Sato M, Iijima M and Takahashi Y1994Japan. J. Appl. Phys.33L1721-L1721
