Microstructure and corrosion resistance of tantalum after nitrogen ion implantation

Abstract

This paper investigates the effect of nitrogen ion implantation on surface structure as well as resistance against tantalum corrosion. Bulk Ta surface was implanted with 30 keV nitrogen ions at a temperature of 100°C with doses between 1 × 10¹⁷ and 1 × 10¹⁸ ions/cm². The implanted samples were characterised by atomic force microscopy, X-ray diffraction analyses and the corrosion test to identify structural, compositional and electrochemical changes at various doses. The experimental results indicate the formation of hexagonal tantalum nitride (TaN_0.43), in addition to the fact that by increasing the ion dose, nitrogen atoms occupy more interstitial spaces in the target crystal, a case which can significantly improve corrosion resistance. The maximum extent in the improvement of the micro hardness was 75% and the reduction in the corrosion current was 83%. According to scanning electronic microscopy and corrosion results, in the dose of 1 × 10¹⁸ ions/cm² the highest corrosion resistance was received against the H₂SO₄ corroding media.