Abstract
TiAlSiN coatings were deposited on Si substrates by ion beam-assisted deposition. The oxidation resistance and mechanism of TiAlSiN at 800°C, 900°C, and 1000°C under a nitrogen atmosphere were discussed and compared with those of TiAlSiN under argon and air atmospheres. The microstructure, bonding characteristics, and phase transition of the coatings were systematically investigated. The results indicated that nitrogen atmosphere effectively inhibited oxidation of the TiAlSiN coatings. The key reason for this improvement was that nitrogen maintained Ti–N and Si–N chemical bonds, and a dense Al2O3 layer was much more easily generated under the nitrogen atmosphere. We used first-principles calculations to investigate the electronic structures and bonding characteristics of TiAlSiN in this work.
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