TiSiN coatings were deposited on WC/TiC/Co substrates using a combined method of arc ion plating and medium-frequency magnetron sputtering. Effects of Ti target currents on coating's properties were studied. Results showed that with Ti target current increasing from 55 to 95 A, surface roughness significantly increased and Si content decreased from 9.87 to 3.22 at.-%. The preferred orientation was TiN (200) below Ti current of 85 A, but changed into TiN (111) at 95 A. As Ti current increased, the hardness increased first and then decreased. The maximum value (39.6 GPa) was achieved at 65 A with the Si content of 8.2 at.-%. Edge effect happened on all samples, which exhibited large differences in Si content and hardness between edge and central regions. The increase in Ti current enhanced the edge effect with a bigger difference in Si contents and a larger affected region.
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