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1-4 of 4 results for photolithography equipment

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Research article

First published 2011-5

Deadlock-free assignment of wafer processing in photolithography equipment - by using a CPN model

Xiaoyi He, Zhiming Wu

Transactions of the Institute of Measurement and Control

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Research article

First published 2026-2

Braj Krishna, Rajneesh Kumar Singh, Yadvendra Kumar Mishra

Journal of Elastomers & Plastics

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Research article

First published 2008-5

D. H. Xiang, M. Chen, Y. P. Ma [...]

Surface Engineering

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Research article

First published 2026-3

Emily L. Pallack, Maxwell W. Oulundsen, Yan Kolpakov [...]

Tissue Engineering Part C: Methods