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Research article

First published 2010-11

Effect of sputtering pressure and temperature on DC magnetron sputtered CrN films

H. N. Shah, R. Jayaganthan, D. Kaur

Surface Engineering

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Research article

First published 2007-8

Effects of nitrogen partial pressure on microstructure,morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering

K. Yang, J. Q. Jiang, M. Y. Gu

Materials Science and Technology

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Research article

First published 2016-4

Composition and optoelectrical properties of sputtering MoSe x films

N. Li, Z.-T. Liu, L.-P. Feng [...]

Surface Engineering

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Research article

First published 2017-3

Tunable electrical resistivity of oxygen-deficient zinc oxide thin films

Y. Wang, Z. J. Peng, Q. Wang [...]

Surface Engineering

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Research article

First published 2024

Impact of deposition pressure on the structural,nanomechanical,and tribological properties of δ-TaN coatings deposited via magnetron sputtering on Ti6Al7Nb alloy

Vivek Singh, Rajesh Kumar Sharma, Rakesh Sehgal

Proceedings of the Institution of Mechanical Engineers,Part E: Journal of Process Mechanical Engineering

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Research article

First published 2019-12

A facile method to prepare a wearable pressure sensor based on fabric electrodes for human motion monitoring

Ronghui Wu, Liyun Ma, Aniruddha Balkrishna Patil [...]

Textile Research Journal

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Research article

First published 1994-5

Surface Features of Conductors Eroded by Sputtering in a Magnetron Glow Discharge Plasma

Khodayar Dehghan, Zhan Shi, Teresa Holbrook Woodrum [...]

Applied Spectroscopy

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Research article

First published 1987-1

Properties of Crn and (Ti,Al)N Coatings Produced by High Rate Sputter Deposition

W. D. Münz, J. Göbel

Surface Engineering

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Research article

First published 1989-8

Radiative and Electrical Properties of a Planar Magnetron Glow Discharge Device

Lori McCaig, Richard Sacks, David Lubman

Applied Spectroscopy

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Research article

First published 1976-9

Emission Spectrographic Analysis of Surfaces with an Ion-Sputtering Source

M. E. Waitlevertch, J. K. Hurwitz

Applied Spectroscopy

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