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Research article

First published 1986-1

Sputtering and Redeposition of Cathode Material during Plasma Nitriding

A. Wells, I. Le R. Strydom

Surface Engineering

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Research article

First published 1988-1

Influence of Sputtering and Redeposition on Compound Layer Growth during Plasma Nitriding

A. Wells, I. le R. Strydom

Surface Engineering

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Research article

First published 2009-3

An accurate and efficient control over the present numerical model of depth of sputtering in focused ion beam milling

S N Bhavsar, S Aravindan, P Venkateswara Rao

Proceedings of the Institution of Mechanical Engineers,Part N: Journal of Nanomaterials,Nanoengineering and Nanosystems

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Research article

First published 1998-5

Surface topography and sputtering behaviour of Cu–6Ag and Cu–1OSn in different plasma atmospheres

S. K. Habib, I. A. Mousa, A. Rizk

Materials Science and Technology

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Research article

First published 2013-7

Advanced indium tin oxide ceramic sputtering targets (rotary and planar) for transparent conductive nanosized films

E Medvedovski, N A Alvarez, C J Szepesi [...]

Advances in Applied Ceramics: Structural,Functional and Bioceramics

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Research article

First published 1999-3

Characterization of Tantalum Films on Analytical Surfaces: Insights into Sputtering of Nonconductors in a Direct-Current Glow Discharge Using Secondary Cathodes

David M. Wayne, Roland K. Schulze, Carl Maggiore [...]

Applied Spectroscopy

Free access

Research article

First published 2012-2

A predictive divergence compensation approach for the fabrication of three-dimensional microstructures using focused ion beam machining

J Sun, X Luo, J Ritchie [...]

Proceedings of the Institution of Mechanical Engineers,Part B: Journal of Engineering Manufacture

Search results

Sputtering and Redeposition of Cathode Material during Plasma Nitriding

Influence of Sputtering and Redeposition on Compound Layer Growth during Plasma Nitriding

An accurate and efficient control over the present numerical model of depth of sputtering in focused ion beam milling

Surface topography and sputtering behaviour of Cu–6Ag and Cu–1OSn in different plasma atmospheres

Advanced indium tin oxide ceramic sputtering targets (rotary and planar) for transparent conductive nanosized films

Characterization of Tantalum Films on Analytical Surfaces: Insights into Sputtering of Nonconductors in a Direct-Current Glow Discharge Using Secondary Cathodes

A predictive divergence compensation approach for the fabrication of three-dimensional microstructures using focused ion beam machining